Plasma Treatment system
M/N: The1-PTS1
01. Feature of Plasma Treatment System
- Chamber dimension: Ø260 x 300 (H) mm
- Frame dimension: 650 (W) x 900 (D) x 1700 (H) mm
- RF power: 200W, 13.56MHz
- Vacuum Gauge: Pirani sensor
- Process gas regulation: 1 or 2 sets of MFC
- Gas compatibility: Ar, O2, N2, etc.
- Vacuum: Ultimate pressure 1.0 x 10-3 Torr
Base pressure 1.0 x 10-2 Torr - Vacuum chamber: Process chamber
- Control system: Manual control
- Purpose: Research and development
02. Application
- Plasma activation
- Plasma etching
- Low temperature plasma ashing
- SEM and TEM sample preparation.
- Fine cleaning of High precision mechanical parts.
