VMD
M/N:The1-VMD
01. Feature of Vacuum Metal Deposition System
- Deposition thickness : Customer specified
- Deposition material : Metals films
- Film thickness uniformity : ≤ ± 5% on 6" substrate
- Deposition : deposition by Thermal evaporation boat
- Throughput : up to 8" substrate x 1 sheet/batch
- Vacuum : Ultimate pressure 5.0 x 10-6 Torr
Base pressure 3.0 x 10-5 Torr - Vacuum chamber : process chamber
- Control system : Manual control
- Purpose : Research and development for Forensic finger mark development
02. Options
- Substrate mask holder
- Substrate Rotation
- Turbo Molecular Pump
- Thickness Monitoring Unit
- 2 boat (2ch P/S)
